Please use this identifier to cite or link to this item:
Files in This Item:
File SizeFormat 
inm2018029.pdf806,33 kBAdobe PDFView/Open
Title: Improved development procedure to enhance the stability of microstructures created by two-photon polymerization
Authors: Purtov, JuliaVerch, AndreasRogin, PeterHensel, René
Publishers Version:
Issue Date: 2018
Published in: Microelectronic Engineering , Volume 194, Page 45-50
Publisher: Amsterdam : Elsevier
Abstract: Natural functional surfaces often rely on unique nano- and micropatterns. To mimic such surfaces successfully, patterning techniques are required that enable the fabrication of three-dimensional structures at the nanoscale. It has been reported that two-photon polymerization (TPP) is a suitable method for this. However, polymer structures fabricated by TPP often tend to shrink and to collapse during the fabrication process. In particular, delicate structures suffer from their insufficient mechanical stability against capillary forces which mainly arisein the fabrication process during the evaporation of the developer and rinsing liquids. Here, we report a modified development approach, which enables an additional UV-treatment to post cross-link created structures before they are dried. We tested our approach on nanopillar arrays and microscopic pillar structures mimicking the moth-eye and the gecko adhesives, respectively. Our results indicate a significant improvement of the me- chanical stability of the polymer structures, resulting in fewer defects and reduced shrinkage of the structures.
Keywords: Two-photon polymerization; Microstructures; Development
DDC: 620
License: CC BY-NC-ND 4.0 Unported
Link to License:
Appears in Collections:Ingenieurwissenschaften

This item is licensed under a Creative Commons License Creative Commons