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Title: XPS investigations of MOCVD tin oxide thin layers on Si nanowires array
Authors: Turishchev, S. Yu.Chuvenkova, OlgaParinova, V.E.Koyuda, D.A.Chumakov, Ratibor G.Presselt, MartinSchleusener, AlexanderSivakov, Vladimir
Publishers Version: https://doi.org/10.1016/j.rinp.2018.09.046
Issue Date: 2018
Published in: Results in Physics 11 (2018)
Publisher: Amsterdam : Elsevier
Abstract: Tin oxide thin layers were grown by metal-organic chemical vapor deposition technique on the top-down nanostructured silicon nanowires array obtained by metal-assisted wet-chemical technique from single crystalline silicon wafers. The composition of the formed layers were studied by high-resolution X-ray photoelectron spectroscopy of tin (Sn 3d) and oxygen (O 1 s) atoms core levels. The ion beam etching was applied to study the layers depth composition profiles. The composition studies of grown tin oxide layers is shown that the surface of layers contains tin dioxide, but the deeper part contains intermediate tin dioxide and metallic tin phases.
Keywords: Silicon nanowires; Metal assisted wet chemical etching; Tin oxides; Metal-organic chemical vapor deposition; X-ray photoelectron spectroscopy; Phase composition
DDC: 530
License: CC BY-NC-ND 4.0 Unported
Link to License: https://creativecommons.org/licenses/by-nc-nd/4.0/
Appears in Collections:Ingenieurwissenschaften



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