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Seifert et al 2020, Phase Formation and High-Temperature Stability.pdf9,38 MBAdobe PDFView/Open
Title: Phase formation and high-temperature stability of very thin co-sputtered Ti-Al and multilayered Ti/Al films on thermally oxidized si substrates
Authors: Seifert, M.Lattner, E.Menzel, S.B.Oswald, S.Gemming, T.
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Issue Date: 2020
Published in: Materials Vol. 13 (2020), No. 9
Publisher: Basel : MDPI AG
Abstract: Ti-Al thin films with a thickness of 200 nm were prepared either by co-sputtering from elemental Ti and Al targets or as Ti/Al multilayers with 10 and 20 nm individual layer thickness on thermally oxidized Si substrates. Some of the films were covered with a 20-nm-thick SiO2 layer, which was used as an oxidation protection against the ambient atmosphere. The films were annealed at up to 800 °C in high vacuum for 10 h, and the phase formation as well as the film architecture was analyzed by X-ray diffraction, cross section, and transmission electron microscopy, as well as Auger electron and X-ray photoelectron spectroscopy. The results reveal that the co-sputtered films remained amorphous after annealing at 600 °C independent on the presence of the SiO2 cover layer. In contrast to this, the γ-TiAl phase was formed in the multilayer films at this temperature. After annealing at 800 °C, all films were degraded completely despite the presence of the cover layer. In addition, a strong chemical reaction between the Ti and SiO2 of the cover layer and the substrate took place, resulting in the formation of Ti silicide. In the multilayer samples, this reaction already started at 600 °C.
Keywords: High-temperature stability; Phase formation; Surface acoustic waves; Thin films; TiAl; Aluminum alloys; Annealing; Auger electron spectroscopy; Binary alloys; Film preparation; High resolution transmission electron microscopy; Multilayers; Oxidation; Silica; Silicides; Silicon; Substrates; Titanium; X ray photoelectron spectroscopy; Ambient atmosphere; Co-sputtered films; High temperature stability; Layer thickness; Oxidation protection; Phase formations; Thermally oxidized; Ti/al multilayers; Multilayer films
DDC: 620
License: CC BY 4.0 Unported
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