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Title: Site-controlled formation of single Si nanocrystals in a buried SiO2 matrix using ion beam mixing
Authors: Xu, X.Prüfer, T.Wolf, D.Engelmann, H.-J.Bischoff, L.Hübner, R.Heinig, K.-H.Möller, W.Facsko, S.von Borany, J.Hlawacek, G.
Publishers Version:
Issue Date: 2018
Published in: Beilstein Journal of Nanotechnology Vol. 9 (2018), No. 1
Publisher: Frankfurt am Main : Beilstein-Institut zur Förderung der Chemischen Wissenschaften
Abstract: For future nanoelectronic devices - such as room-temperature single electron transistors - the site-controlled formation of single Si nanocrystals (NCs) is a crucial prerequisite. Here, we report an approach to fabricate single Si NCs via medium-energy Si+ or Ne+ ion beam mixing of Si into a buried SiO2 layer followed by thermally activated phase separation. Binary collision approximation and kinetic Monte Carlo methods are conducted to gain atomistic insight into the influence of relevant experimental parameters on the Si NC formation process. Energy-filtered transmission electron microscopy is performed to obtain quantitative values on the Si NC size and distribution in dependence of the layer stack geometry, ion fluence and thermal budget. Employing a focused Ne+ beam from a helium ion microscope, we demonstrate site-controlled self-assembly of single Si NCs. Line irradiation with a fluence of 3000 Ne+/nm2 and a line width of 4 nm leads to the formation of a chain of Si NCs, and a single NC with 2.2 nm diameter is subsequently isolated and visualized in a few nanometer thin lamella prepared by a focused ion beam (FIB). The Si NC is centered between the SiO2 layers and perpendicular to the incident Ne+ beam.
Keywords: Helium ion microscopy; Ion beam mixing; Monte carlo simulations; Phase separation; Single electron transistor; Budget control; Field effect transistors; High resolution transmission electron microscopy; Intelligent systems; Ion beams; Ion microscopes; Ions; Mixing; Monte Carlo methods; Nanoclusters; Nanocrystals; Phase separation; Self assembly; Silica; Single electron transistors; Transmission electron microscopy; Binary collision approximations; Controlled self-assembly; Energy filtered transmission electron microscopy; Experimental parameters; Helium ion microscopes; Helium ion microscopies; Ion beam mixing; Kinetic Monte Carlo methods; Silicon
DDC: 530
License: CC BY 4.0 Unported
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